Nt: Not applicable. Informed Consent Statement: Not applicable. Information Availability Statement: The data presented within this study are offered on request from the corresponding author. Acknowledgments: The authors thank Fuqiang Lin for his ideas within this study. Conflicts of Interest: The authors Methyclothiazide Carbonic Anhydrase declare no conflict of interest.
applied sciencesArticleUniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography ProcessGa Eul Kim 1,2, , Hyuntae Kim 1, , Kyoohee Woo 1 , Yousung Kang 2 , Seung-Hyun Lee 1 , Yongho Jeon two , Moon G. Lee two, and Sin Kwon 1, Department of Printed Electronics, Nano-Convergence Manufacturing Systems Analysis Division, Korea Institute Machinery Materials (KIMM), Daejeon-si 34103, Korea; [email protected] (G.E.K.); [email protected] (H.K.); [email protected] (K.W.); [email protected] (S.-H.L.) Department of Mechanical Engineering, Ajou University, Suwon-si 16499, Korea; [email protected] (Y.K.); [email protected] (Y.J.) Correspondence: [email protected] (M.G.L.); [email protected] (S.K.); Tel.: +82-219-2338 (M.G.L.); +82-42-868-7219 (S.K.) These authors contributed equally to this perform.Citation: Kim, G.E.; Kim, H.; Woo, K.; Kang, Y.; Lee, S.-H.; Jeon, Y.; Lee, M.G.; Kwon, S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Approach. Appl. Sci. 2021, 11, 9571. https://doi.org/10.3390/ app11209571 Academic Editor: Arkadiusz Gola Received: 17 September 2021 Accepted: 7 October 2021 Published: 14 OctoberAbstract: We aimed to raise the processing region of your roll-to-roll (R2R) nanoimprint lithography (NIL) method for higher productivity, utilizing a extended roller. It’s frequent to get a extended roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of speak to stress amongst the rollers, which results in defects for instance non-uniform patterning. The non-uniformity of your get in touch with stress with the traditional R2R NIL technique was investigated via finite element (FE) analysis and experiments inside the traditional program. To resolve the problem, a new large-area R2R NIL uniform pressing technique with 5 multi-backup rollers was proposed and manufactured rather on the standard program. As a Aminourea (hydrochloride);Hydrazinecarboxamide (hydrochloride) In Vitro preliminary experiment, the possibility of uniform get in touch with pressure was confirmed by utilizing only the stress at both ends and 1 backup roller inside the center. A a lot more even make contact with pressure was accomplished by using all five backup rollers and applying an acceptable pushing force to each and every backup roller. Machine understanding approaches had been applied to locate the optimal mixture of your pushing forces. Within the standard pressing procedure, it was confirmed that pressure deviation of your contact area occurred at a amount of 44 ; when the improved technique was applied, pressure deviation dropped to five . Keyword phrases: roller bending; make contact with stress; roll-to-roll method; nanoimprint lithography; higher productivity1. Introduction Nanoimprint lithography (NIL), which was introduced by Chou in 1995, has been regarded as a promising technologies with outstanding advantages. Determined by the mechanical deformation of a curable resist, NIL is a fabrication method in which a substrate is coated and a desired pattern is pressed in to the coating to replicate an inverse pattern [1]. Since it makes it possible to effortlessly replicate patterns working with molds with fine patterns, NIL technology is hugely applicable to the manufacturing course of action of functional optical devices, semiconductors or displ.
