Nt: Not applicable. Informed Consent D-Lyxose manufacturer Statement: Not applicable. Data Availability Statement: The data presented in this study are accessible on request from the corresponding author. Acknowledgments: The authors thank Fuqiang Lin for his recommendations in this study. Conflicts of Interest: The authors declare no conflict of interest.
applied sciencesArticleUniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography ProcessGa Eul Kim 1,2, , Hyuntae Kim 1, , Kyoohee Woo 1 , Yousung Kang 2 , Seung-Hyun Lee 1 , Yongho Jeon 2 , Moon G. Lee 2, and Sin Kwon 1, Department of Printed Electronics, Nano-Convergence Manufacturing Systems Analysis Division, Korea Institute Machinery Materials (KIMM), Daejeon-si 34103, Korea; [email protected] (G.E.K.); [email protected] (H.K.); [email protected] (K.W.); [email protected] (S.-H.L.) Division of Mechanical Engineering, Ajou University, Suwon-si 16499, Korea; [email protected] (Y.K.); [email protected] (Y.J.) Correspondence: [email protected] (M.G.L.); [email protected] (S.K.); Tel.: +82-219-2338 (M.G.L.); +82-42-868-7219 (S.K.) These authors contributed equally to this operate.Citation: Kim, G.E.; Kim, H.; Woo, K.; Kang, Y.; Lee, S.-H.; Jeon, Y.; Lee, M.G.; Kwon, S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Method. Appl. Sci. 2021, 11, 9571. https://doi.org/10.3390/ app11209571 Academic Editor: Arkadiusz Gola Received: 17 September 2021 Accepted: 7 Sorbinil Epigenetic Reader Domain October 2021 Published: 14 OctoberAbstract: We aimed to improve the processing region in the roll-to-roll (R2R) nanoimprint lithography (NIL) procedure for higher productivity, working with a lengthy roller. It really is common for a lengthy roller to possess bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact stress involving the rollers, which results in defects such as non-uniform patterning. The non-uniformity in the make contact with pressure in the conventional R2R NIL program was investigated by means of finite element (FE) evaluation and experiments within the traditional technique. To resolve the problem, a new large-area R2R NIL uniform pressing method with 5 multi-backup rollers was proposed and manufactured alternatively of the standard system. As a preliminary experiment, the possibility of uniform make contact with pressure was confirmed by utilizing only the stress at both ends and 1 backup roller in the center. A additional even make contact with stress was accomplished by utilizing all five backup rollers and applying an suitable pushing force to every backup roller. Machine mastering tactics were applied to discover the optimal mixture on the pushing forces. Within the traditional pressing method, it was confirmed that pressure deviation with the make contact with region occurred at a amount of 44 ; when the enhanced program was applied, stress deviation dropped to 5 . Search phrases: roller bending; make contact with pressure; roll-to-roll process; nanoimprint lithography; higher productivity1. Introduction Nanoimprint lithography (NIL), which was introduced by Chou in 1995, has been regarded as a promising technology with outstanding benefits. Depending on the mechanical deformation of a curable resist, NIL is really a fabrication strategy in which a substrate is coated as well as a desired pattern is pressed in to the coating to replicate an inverse pattern [1]. Since it tends to make it attainable to conveniently replicate patterns working with molds with fine patterns, NIL technology is very applicable to the manufacturing procedure of functional optical devices, semiconductors or displ.
